| 摘要 |
A blower apparatus for fabricating a semiconductor device is provided to prevent the particles generated an operator or a mechanical operation from being dropped to the surface of a wafer by installing a blower apparatus for artificially forming an air flow over the wafer. A blower apparatus(10) for fabricating a semiconductor device prevents particles from being dropped to the surface of a wafer(2) placed on a stage(1) by an operator or a mechanical operation. A ventilation part(20) ventilates compressed air by a compression ratio to a portion over the wafer. An absorption part(30) absorbs the air blown from the ventilation part and particles pushed out by the air from the ventilation part. The ventilation part and the absorption part are installed over both sides of the wafer in a position higher than the wafer by a height, confronting each other.
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