| 摘要 |
A POLISHING COMPOSITION FOR A SUBSTRATE FOR MEMORY HARD DISK, COMPRISING SILICA PARTICLES IN AN AQUEOUS MEDIUM, WHEREIN THE SILICA PARTICLES SATISFY A SPECIFIED RELATIONSHIP BETWEEN AN AVERAGE PARTICLE SIZE OF THE SILICA PARTICLES ON THE NUMBER BASIS AND A STANDARD DEVIATION ON THE NUMBER BASIS, WHEREIN THE AVERAGE PARTICLE SIZE IS OBTAINED BY A DETERMINATION BY TRANSMISSION ELECTRON MICROSCOPE (TEM) OBSERVATION, AND WHEREIN A PARTICLE SIZE AND A CUMULATIVE VOLUME FREQUENCY IN A RANGE OF PARTICLE SIZES OF FROM 60 TO 120 NM SATISFIES A SPECIFIED RELATIONSHIP; A METHOD OF REDUCING MICROWAVINESS OF A SUBSTRATE FOR MEMORY HARD DISK, COMPRISING THE STEP OF POLISHING AN NI-P PLATED SUBSTRATE FOR MEMORY HARD DISK WITH THE POLISHING COMPOSITION. THE METHOD CAN BE SUITABLY USED FOR THE MANUFACTURE OF A SUBSTRATE FOR PRECISION PARTS, SUCH AS A SUBSTRATE FOR MEMORY HARD DISK.(FIG.1) |
