FLUORINE BARRIER LAYER BETWEEN CONDUCTOR AND INSULATOR FOR DEGRADATION PREVENTION

摘要

METHOD OF IMPROVING THE RESISTANCE OF A METAL AGAINST DEGRADATION FROM EXPOSURE TO FLUORINE RELEASED FROM A FLUORINE- CONTAINING MATERIAL BY FORMING A FLUORINE-BARRIER LAYER BETWEEN THE INSULATOR MATERIAL AND THE METAL. THE INVENTION IS ESPECIALLY USEFUL IN IMPROVING CORROSION AND POISONING RESISTANCE OF METALLURGY, SUCH AS ALUMINUM METALLURGY, IN SEMICONDUCTOR STRUCTURES. THE INVENTION ALSO COVERS INTEGRATED CIRCUIT STRUCTURES MADE BY THIS METHOD. (FIG. 2F)