发明名称 OPTICAL SUBSTRATE, MANUFACTURING METHOD OF OPTICAL SUBSTRATE, PLANAR LIGHTING DEVICE, AND ELECTROOPTICAL APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an optical substrate capable of improving the evenness of luminance of light emitted from an emission surface and improving the productivity of an electrooptical apparatus, to provide a manufacturing method of the optical substrate, and to provide a planar lighting device and a liquid crystal display system provided with the optical substrate. <P>SOLUTION: Droplets of substrate layer-forming material are ejected to an emission surface 22b of a light guide plate 22 to form a liquid film, the liquid film is cold-set or heat-set and, thereby, a substrate layer 24 which can repel the droplets of lens-forming material and refracts and diffuses light made incident from the emission surface 22b is formed. Further, droplets of the lens-forming material are ejected to a lens-forming surface 24a of the substrate layer 24 and the ejected droplets are irradiated with ultraviolet rays so that microlenses are formed. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006350180(A) 申请公布日期 2006.12.28
申请号 JP20050178973 申请日期 2005.06.20
申请人 SEIKO EPSON CORP 发明人 HASEI HIRONOBU
分类号 G02B5/02;F21V8/00;F21Y101/02;G02B3/00;G02F1/1335;G02F1/13357 主分类号 G02B5/02
代理机构 代理人
主权项
地址