发明名称 METHOD OF REDUCING PRESSURE IN GAS-INTRODUCED CHAMBER CONTAINING HYDROGEN AND PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method capable of reducing the pressure in a chamber to which a gas containing hydrogen is introduced in a short time and a processing apparatus suitable for the method. SOLUTION: The method related to an embodiment disclosed herein is the method of reducing the pressure in the chamber to which the gas containing hydrogen is introduced. The method includes a step (1) of supplying water vapor into the chamber or inside of connection part connecting the chamber and a pump from the outside of the chamber, and a step (2) of reducing the pressure of the inside by the pump. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006351960(A) 申请公布日期 2006.12.28
申请号 JP20050178360 申请日期 2005.06.17
申请人 APPLIED MATERIALS INC 发明人 GOTO HIDEAKI;SHIMIZU TAKASHI
分类号 H01L21/302 主分类号 H01L21/302
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