Method for fabricatiing three-dimensional microstructure by fib-cvd and drawing system for three-dimensional microstruture

摘要

There are provided a fabrication method of a nanostructure by FIB-CVD which enables fabrication of a three-dimensional nanostructure, especially that without a support such as a terrace structure or a hollow structure, and a drawing system thereof. The three-dimensional nanostructure is fabricated by controlling a focused ion beam to determine a beam irradiation position or time based on discrete drawing data of a multilayer structure generated by calculating a cross-sectional shape divided in a vertical direction of a three-dimensional nanostructure model designed using an electronic microcomputer.