| 摘要 |
Diffusion equipment for fabricating a semiconductor device is provided to prevent high-temperature used gas exhausted to a gas exhaust pipe from being attached to the inner wall of the gas exhaust pipe by installing a heat blocking part having a vacuum air layer on the circumference of the gas exhaust pipe through which high-temperature used gas is exhausted. A gas exhaust pipe(200) guides exhaustion of the gas in a reaction furnace(110). A pump forcibly exhausts the gas, installed at one end of the gas exhaust pipe. A heat blocking part prevents the heat of the gas exhausted from the gas exhaust pipe from being transferred to the outside, installed in the gas exhaust pipe. The heat blocking block additionally includes a connection pipe(240) connected to the pump.
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