| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition capable of forming a resist pattern reduced in roughness and to provide a resist pattern-forming method and to provide a compound suitable for the positive resist composition, and a polyhydric phenol compound suitable as a raw material for the compound. <P>SOLUTION: The present invention provides the polyhydric phenol compound represented by formula (I) [wherein R<SB>11</SB>to R<SB>12</SB>are each independently a 3-10C branched alkyl group] and having 300-2,500 molecular weight, the compound in which a part or all of hydrogen atom of a phenolic hydroxy group in the polyhydric phenol compound is substituted with an acid-dissociable dissolution-suppressing group, and the positive resist composition containing the compound. <P>COPYRIGHT: (C)2007,JPO&INPIT |
