发明名称 Method of creating photo mask data, method of photo mask manufacturing, and method of manufacturing semiconductor device
摘要 A method of creating photo mask data includes preparing design data of a photo mask, generating drawing data of the photo mask by using the design data, generating inspection control information configured to control inspection of defect on the photo mask by using the drawing data, and generating drawing and inspection data including the drawing data and the inspection control information by providing the drawing data with the inspection control information.
申请公布号 US2006292458(A1) 申请公布日期 2006.12.28
申请号 US20050187003 申请日期 2005.07.22
申请人 TSUTSUI TOMOHIRO;IKENAGA OSAMU 发明人 TSUTSUI TOMOHIRO;IKENAGA OSAMU
分类号 G03C5/00;G03F1/84;H01L21/027 主分类号 G03C5/00
代理机构 代理人
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