| 摘要 |
A semiconductor manufacturing gas supply apparatus is provided to restrain the damage of an injector by forming the injector and a body as one piece. A semiconductor manufacturing gas supply apparatus is used for spraying a process gas onto a semiconductor wafer. The semiconductor manufacturing gas supply apparatus includes a body(31), a plurality of nozzles, and a plurality of injectors. The plurality of nozzles(32) are fixed to the body to supply the process gas onto the wafer. The plurality of injectors enclose the plurality of nozzles, respectively. The plurality of injectors are prolonged from the body as one piece. Each nozzle is protruded from the body as much as 15 to 20 nm.
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