| 摘要 |
PROBLEM TO BE SOLVED: To provide an electro-optical display device preventing a display unevenness by simplifying a manufacturing process for a TFT structure, while accurately controlling the film thickness of a semiconductor layer as a TFT channel without limiting the quality of the material of source and drain electrodes. SOLUTION: In the electro-optical display device, the drain electrode 26 is disposed so as to be extended extensively over the upper section of a transparent insulating substrate 1 in the lower section of a picture-element electrode 30 from the upper section of an active region layer AR. In the source electrode 24 and a source wiring 25, the end faces are disposed at places retracted from either end face of a semiconductor film 6. The end face of the drain electrode 26 on the active region layer AR is also disposed at the place retracted from the end face in a relationship approximately parallel with the semiconductor film 6. COPYRIGHT: (C)2007,JPO&INPIT
|
