发明名称 PLASMA CLEANING TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To enlarge a cleaning treatment space to cope with various treating objects with different thicknesses by securing a wide space between counter electrodes serving as the cleaning treatment space. SOLUTION: A third electrode 7 is placed between the pair of counter electrodes 3 for generating plasma extending from one electrode to the other, the counter electrodes being provided with a process gas supplying means 5 supplying the process gas between the counter electrodes. A narrow discharge space d easy for spark discharging is formed at a part between the counter electrodes. Otherwise, the space between the counter electrodes is irradiated with soft X-rays to generate residual electrons necessary for the initial lighting time of plasma. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006346518(A) 申请公布日期 2006.12.28
申请号 JP20050172198 申请日期 2005.06.13
申请人 YAMATO SCIENT CO LTD 发明人 OKAWA HIROSHI;KOMINE EIJI;AKITSU TETSUYA
分类号 B08B7/00;H01L21/027;H01L21/304;H01L21/3065 主分类号 B08B7/00
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