发明名称 |
Composition for removing conductive materials and manufacturing method of array substrate using the same |
摘要 |
A composition for removing a conductive material and a manufacturing method of an array substrate using the composition, wherein the composition may include a nitric acid of about 3 to 15 wt %, a phosphoric acid of about 40 to 70 wt %, an acetic acid of about 5 to 35 wt %. The composition may further include a chlorine compound of about 0.05 to 5 wt %, a chlorine stabilizer of about 0.01 to 5 wt %, a pH stabilizer of about 0.01 to 5 wt %, and water of residual quantity.
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申请公布号 |
US2006289383(A1) |
申请公布日期 |
2006.12.28 |
申请号 |
US20060452387 |
申请日期 |
2006.06.14 |
申请人 |
SONG KYE-CHAN;KIM JONG I;LEE KYOUNG-MOOK;CHO SAM-YOUNG;KIM HYUN-CHEOL;KIM NAM-SEO |
发明人 |
SONG KYE-CHAN;KIM JONG I.;LEE KYOUNG-MOOK;CHO SAM-YOUNG;KIM HYUN-CHEOL;KIM NAM-SEO |
分类号 |
C30B33/00;B44C1/22;C09K13/00;C09K13/06 |
主分类号 |
C30B33/00 |
代理机构 |
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代理人 |
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地址 |
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