发明名称 METHOD FOR MAKING INTEGRATED CIRCUIT CHIP HAVING CARBON NANOTUBE COMPOSITE INTERCONNECTION VIAS
摘要 Conductive paths in an integrated circuit are formed using multiple undifferentiated carbon nanotubes embedded in a conductive metal, which is preferably copper. Preferably, conductive paths include vias running between conductive layers. Preferably, composite vias are formed by forming a metal catalyst pad on a conductor at the via site, depositing and etching a dielectric layer to form a cavity, growing substantially parallel carbon nanotubes on the catalyst in the cavity, and filling the remaining voids in the cavity with copper. The next conductive layer is then formed over the via hole.
申请公布号 US2006292861(A1) 申请公布日期 2006.12.28
申请号 US20060458726 申请日期 2006.07.20
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FURUKAWA TOSHIHARU;HAKEY MARK C.;HORAK DAVID V.;KOBURGER CHARLES W.III;MASTERS MARK E.;MITCHELL PETER H.;POLONSKY STANISLAV
分类号 H01L21/4763;H01L21/285;H01L21/768;H01L23/522 主分类号 H01L21/4763
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