| 发明名称 |
EXPOSURE APPARATUS, EXPOSURE METHOD, MAINTENANCE METHOD AND DEVICE MANUFACTURING METHOD |
| 摘要 |
An exposure apparatus (EX) is provided with a supply port (8) for supplying a light path space (K) for exposure light (EL) with a liquid (2), and a liquid supply system (10) for supplying the supply port (8) with ionized liquids (2A, 2B). |
| 申请公布号 |
WO2006137410(A1) |
申请公布日期 |
2006.12.28 |
| 申请号 |
WO2006JP312347 |
申请日期 |
2006.06.20 |
| 申请人 |
NIKON CORPORATION;NAGAHASHI, YOSHITOMO;NAKANO, KATSUSHI |
发明人 |
NAGAHASHI, YOSHITOMO;NAKANO, KATSUSHI |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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