| 摘要 |
Provided is a method for forming a pattern on a carbon nanotube layer on the basis of SAM(Self-Assembled Monolayer treatment) to allow carbon nanoparticles to grow in desired patterns without going through a separate patterning process of the carbon nanotube layer. The method for forming a pattern on a carbon nanotube layer comprises the steps of: providing a substrate(11); forming a self-assembled layer(12) of a desired pattern on the substrate(11); providing carbon gas from a bath(50) to the self-assembled layer(12) and performing ultrasonication to grow a carbon nanotube(13) by using the self-assembled layer(12) as a nucleation site. The self-assembled layer(12) is formed by proving a soft mold such as PDMS to allow self-assemble substance to be absorbed by the soft mold; and printing the soft mold onto a designated region on the substrate(11). |
