| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which diminishes defects in a resist pattern and has necessary lithography properties, and to provide a method of forming a resist pattern. <P>SOLUTION: The positive resist composition contains a resin component and an acid generator component, wherein the resin component contains a copolymer having a constitutional unit derived from an acrylic ester containing an acid-dissociable dissolution inhibiting group containing a mono- or polycyclic group, a constitutional unit derived from an acrylic ester containing a lactone-containing cyclic group, a constitutional unit derived from an acrylic ester containing a polycyclic group containing a hydroxyl group and/or a cyano group, and a constitutional unit represented by formula (a4-1). <P>COPYRIGHT: (C)2007,JPO&INPIT |
