| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus and an adjusting method for keeping a uniform beam pitch on an image plane even when an LD array with large bending in a light source arrangement is used. <P>SOLUTION: The exposure apparatus 10 projects a plurality of beams from an LD array 12a of an optical unit 12 via an imaging optical system 12b onto an image plane to scan and expose a recording medium T, wherein the apparatus is equipped with a motor 17 to rotate the optical unit 12, a light accepting unit 15 to measure a beam pitch on the image plane, and a control unit 18 to control to rotate the optical unit by the motor against the image plane based on the measurement result of the beam pitch. <P>COPYRIGHT: (C)2007,JPO&INPIT |
