| 摘要 |
A method of forming an electronic device on a substrate 10 , comprising: embossing the substrate 10 , surface treating the substrate so that unindented portions 11 repel a solution of a first material 60 , and depositing a solution of the first material 60 in indentations 12 on the substrate 10 formed by the embossing. The substrate is then annealed so that level of the first material is the same as the surface of the substrate. The first material 60 in the indentations can then, for example, be used as the source and drain in the subsequent formation of a TFT.
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