NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

A negative resist composition comprising an alkali-soluble resin component, an acid generator component capable of acid generation upon exposure to light and a crosslinking agent component, wherein the alkali-soluble resin component is a copolymer containing structural units containing an alicyclic group having a fluorinated hydroxyalkyl and structural units derived from an acrylic ester containing a hydroxylated alicyclic acid group, and wherein the crosslinking agent component contains an alkyleneurea crosslinking agent.