发明名称 DEVICE FOR PLASMA PROCESS
摘要 A plasma processing apparatus is provided to prevent polymers from falling on the surface of a confinement ring by using alumina instead of quartz as a confinement ring material. A plasma processing apparatus compresses a process chamber(12), two parallel electrodes, and a plurality of confinement rings. The two parallel electrodes(18t,18b) are installed in the process chamber. The plurality of confinement rings(20) are used for confining a predetermined plasma within a predetermined region between the two parallel electrodes. The plurality of confinement rings are made of alumina.
申请公布号 KR20060134689(A) 申请公布日期 2006.12.28
申请号 KR20050054576 申请日期 2005.06.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SEOK, SE MAN
分类号 H01L21/205 主分类号 H01L21/205
代理机构 代理人
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