发明名称 SILICON THIN-FILM TRANSISTOR AND METHOD OF FABRICATING THE SAME
摘要 PROBLEM TO BE SOLVED: To prevent effectively a warp of a substrate so as to provide a good-quality silicon TFT, and to provide a method of fabricating a good-quality silicon TFT. SOLUTION: The silicon thin-film transistor is provided with buffer layers 11a, 11b formed on both surfaces of a substrate, on the buffer layer 11a on one side being arranged a silicon channel, on which is formed a gate insulation layer 13, and on which a gate 14 is provided. By this arrangement, the substrate is prevented from being warped, thereby providing a good-quality operational performance. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006352119(A) 申请公布日期 2006.12.28
申请号 JP20060161364 申请日期 2006.06.09
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 TEI CHISHIN;KIM DO-YOUNG;KIM JONG-MAN;KWON JANG-YEON;NOGUCHI TAKASHI
分类号 H01L29/786;H01L21/20;H01L21/336 主分类号 H01L29/786
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