| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition for forming a resist pattern with excellent resolution, and to provide a method for forming a resist pattern. <P>SOLUTION: The positive resist composition contains a resin component (A) the alkali solubility of which is increased by an effect of an acid and an acid generator component (B) which generates an acid by exposure, wherein the resin component (A) is a mixture of a copolymer (A1) having a structural unit (a1) derived from an acrylic acid ester having a cyclic acid-dissociative solubility-inhibiting group and a copolymer (A1') having a structural unit (a1') derived from an acrylic acid ester having a branched chain acid-dissociative solubility-inhibiting group. <P>COPYRIGHT: (C)2007,JPO&INPIT |
