| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of controlling the temperature of a movable part without directly supplying a refrigerant to the movable part. <P>SOLUTION: A wafer stage holds a wafer attached on a reference base in a vacuum container and to be exposed. A mask stage (6) holds an exposure mask. A beam source (7) irradiates the wafer with an energy beam for exposure through the exposure mask. An intermediate block (21) is supported so as to be movable in a two-dimensional direction. A cooling means including a heat-absorbing section (35) is fixed on the reference base. An optical device (20) is supported so as to be movable in an optical axis direction. The optical device used to observe an alignment mark on the exposure mask. A first heat transmitting structure (36) forms a heat transmitting path between the intermediate block and the heat-absorbing section, and permits the intermediate block to move in a two-dimensional direction. A second heat transmitting structure (39) forms a heat transmitting path between the intermediate block and the optical device, and permits the optical device to move. <P>COPYRIGHT: (C)2007,JPO&INPIT |
