| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a projection aligner capable of exactly aligning a reticle and a photosensitive substrate through simple constitution or procedure to form a conductive pattern on the optimum position of the photosensitive substrate. <P>SOLUTION: A light response member performing optical response by the irradiation of exposure light is employed to form the projection image of a pattern reference mark on the optical response member, by irradiating the exposure light to the optical response member and detecting the position of the projection image of the pattern reference mark, as well as the position of a substrate reference mark showing the reference position of the photosensitive substrate, thereby positioning a mounting means which mounts the photosensitive substrate at a position whereat the pattern is to be projected on the photosensitive substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
