发明名称 SUBSTRATE CONVEYANCE MECHANISM AND PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a substrate conveyance mechanism for maintaining throughput at a high level and mounting a substrate at a conveyance target position accurately without any positional deviation. SOLUTION: The substrate conveyance mechanism for conveying the circular substrate W comprises a conveyance arm section 60 that has a pick 62 for holding the substrate at the tip and can bend and stretch, and can turn; a photosensor section 68 that is provided at a standby location on the conveyance path of the substrate and detects the presence or absence of the substrate; an output detection section 72 for detecting the turning direction of the substrate carried through the standby location and detects each output of the photosensor section in an straight-advance direction; an amount-of-deviation operation section 74 for obtaining the amount of deviation of turn that is the amount of deviation in the turning direction of the substrate and the amount of deviation of straight advance that is the amount of deviation in the direction of straight advance, based on each detected value obtained by the output detection section, a radius measured in advance in the substrate, and a predetermined reference value; and an arm control section 76 for controlling the conveyance arm section so that the amount of deviation of turn and the amount of deviation of straight advance can be canceled out. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006351883(A) 申请公布日期 2006.12.28
申请号 JP20050176993 申请日期 2005.06.16
申请人 TOKYO ELECTRON LTD 发明人 ISHIZAWA SHIGERU
分类号 H01L21/677;B65G49/07;H01L21/02 主分类号 H01L21/677
代理机构 代理人
主权项
地址