发明名称 JUNCTION TYPE FIELD EFFECT TRANSISTOR, MANUFACTURING METHOD THEREOF, AND SOLID-STATE IMAGING APPARATUS
摘要 PROBLEM TO BE SOLVED: To simplify a structure of a junction type field effect transistor. SOLUTION: The junction type field effect transistor formed on a semiconductor substrate 100 is constituted with inclusion of a source region 101, a drain region 102, a channel region 103 formed between the source region 101 and the drain region 102, and a gate region 107 formed under at least the channel region 103. The channel region 103 forms a part of the surface of semiconductor substrate 100 with its upper surface. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006351729(A) 申请公布日期 2006.12.28
申请号 JP20050174250 申请日期 2005.06.14
申请人 CANON INC 发明人 KOBAYASHI MASAHIRO;SHINOHARA MASATO;ITANO TETSUYA
分类号 H01L27/146 主分类号 H01L27/146
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