发明名称 SPUTTERING TARGET, MAGNETIC RECORDING MEDIUM, METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To improve the thermal stability and the SNR of a magnetic recording medium by utilizing an enhanced sputtering target to achieve enhancement in magnetocrystalline anisotropy and increased grain-to-grain segregation. SOLUTION: The sputtering target contains cobalt (Co), platinum (Pt), a single-component oxide or a multi-component oxide, and an elemental metal additive. The elemental metal additive has a reduction potential of greater than -0.03 electron volts, and is substantially insoluble with cobalt (Co) at a room temperature. The elemental metal additive is copper (Cu), silver (Ag), or gold (Au), and the sputtering target is further comprised of chromium (Cr) and/or boron (B). The sputtering target is comprised of between 2 atomic% and 10 atomic% copper (Cu), silver (Ag), or gold (Au) or other elemental metal additive. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006351164(A) 申请公布日期 2006.12.28
申请号 JP20060088246 申请日期 2006.03.28
申请人 HERAEUS INC 发明人 RACINE MICHAEL G;DAS ANIRBAN;KENNEDY STEVEN ROGER;CHUNG KYUNG
分类号 G11B5/851;G11B5/66 主分类号 G11B5/851
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