POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition having good solubility in a resist solvent and capable of suppressing variation in pattern size when exposure energy varies, and to provide a method of forming a resist pattern.

SOLUTION: The positive resist composition contains (A) a resin component and (B) an acid generator component, wherein the resin component (A) is a copolymer having a mono(α-lower alkyl) acrylate-based constitutional unit (a0) containing a carboxy group and/or a hydroxyl group, a mono(α-lower alkyl) acrylate-based constitutional unit (a1) containing an acid-dissociable dissolution inhibiting group, a mono(α-lower alkyl) acrylate-based constitutional unit (b1) having a lactone ring, and a constitutional unit (c1) derived from formula (1), wherein R is a lower alkyl group or H; R11and R12are each independently a lower alkyl group; (n) is an integer of 1-5; and A is a bi- to hexavalent organic group.

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