发明名称 |
METHOD AND APPARATUS FOR PERFORMING HYDROGEN OPTICAL EMISSION ENDPOINT DETECTION FOR PHOTORESIST STRIP AND RESIDUE REMOVAL |
摘要 |
Methods for monitoring and detecting optical emissions while performing photoresist stripping and removal of residues from a substrate or a film stack on a substrate are provided herein. In one embodiment, a method is provided that includes positioning a substrate comprising a photoresist layer into a processing chamber; processing the photoresist layer using a multiple step plasma process; and monitoring the plasma for a hydrogen optical emission during the multiple step plasma process; wherein the multiple step plasma process includes removing a bulk of the photoresist layer using a bulk removal step; and switching to an overetch step in response to the monitored hydrogen optical emission.
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申请公布号 |
US2006289384(A1) |
申请公布日期 |
2006.12.28 |
申请号 |
US20060467842 |
申请日期 |
2006.08.28 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
PAVEL ELIZABETH G.;KAWAGUCHI MARK N.;PAPANU JAMES S. |
分类号 |
G01L21/30;C23F1/00;H01J37/32;H01L21/302;H01L21/306;H01L23/00 |
主分类号 |
G01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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