| 发明名称 |
COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound suitable for the positive resist composition. <P>SOLUTION: The present invention provides a compound represented by general formula (I) [wherein R<SP>11</SP>to R<SP>17</SP>are each independently a 1-10C alkyl group or an aromatic hydrocarbon group which may contain a hetero atom in the structure; X is a cycloaliphatic group] in which a part or all of hydrogen atoms of phenolic hydroxy groups in a polyhydric phenol compound having 300-2,500 molecular weight are substituted with acid-dissociable dissolution-suppressing groups. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2006347974(A) |
申请公布日期 |
2006.12.28 |
| 申请号 |
JP20050177504 |
申请日期 |
2005.06.17 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
SHIONO HIROHISA;HIRAYAMA HIROSHI;HANEDA HIDEO |
| 分类号 |
C07C69/712;G03F7/039;H01L21/027 |
主分类号 |
C07C69/712 |
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