发明名称 METHOD AND APPARATUS OF CLEANING SUBSTRATE USING NON-NEWTONIAN FLUID
摘要 PROBLEM TO BE SOLVED: To provide a method of cleaning a substrate using a non-newtonian fluid. SOLUTION: A non-newtonian fluid flowing between a surface of a supply unit 704 and a surface of a substrate 702 has a high yield point compared with shearing stress applied to the non-newtonian fluid over a gap 706. Therefore, most of flow of the fluid becomes plug flow. In other words, part of flow to be the plug flow substantially extends between the surface of the supply unit 704 and the surface of the substrate 702. Therefore, a flow rate profile of the flow is substantially uniform. In an embodiment, the term "substantially" implies that the plug flow extends about 80% to 100% between the surfaces. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006352130(A) 申请公布日期 2006.12.28
申请号 JP20060164312 申请日期 2006.06.14
申请人 LAM RES CORP 发明人 DE LARIOS JOHN M;RAVKIN MIKE;FARBER JEFFREY;KOROLIK MIKHAIL;REDEKER FRED C
分类号 H01L21/304 主分类号 H01L21/304
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