发明名称 |
Method for determining material interfacial and metrology information of a sample using atomic force microscopy |
摘要 |
A method for determining interfacial information and critical dimensions of a sample using atomic force microscopy. Tip-specimen deconvolution is performed on the scan lines before the critical dimension information processing. Local maxima and minima or local slope change of each scan line are found on a plurality of scan lines. A best fit line is then found for the plurality of maxim and minima or slope change points. Two best fit lines may be found using a plurality of maxima or minima or slope change points. An intersection of the two best fit lines can be used to determine a critical dimension such as a transition point. Such a method may be used to determine a track width of a trapezoidal magnetic write head or may be used to determine the location of a flare point on a magnetic write head.
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申请公布号 |
US2006289749(A1) |
申请公布日期 |
2006.12.28 |
申请号 |
US20050149789 |
申请日期 |
2005.06.09 |
申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES |
发明人 |
HWU JUSTIN J. |
分类号 |
G01Q10/00;G01Q10/06;G01Q30/04;G01Q60/24 |
主分类号 |
G01Q10/00 |
代理机构 |
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