| 摘要 |
An apparatus for processing a substrate is provided to prevent a washing solution from scattering to the dry-processed substrate, by disposing a plate for forming an air curtain near a washing nozzle. A transfer unit(130) is configured to transfer a substrate(S) in a horizontal state. A first jetting unit(112) is configured to supply a washing solution to the substrate. A second jetting unit(124) is configured to supply dry air to the substrate, which is processed by the washing solution. A first plate(140) is disposed at a lateral side of the first jetting unit, and prevents the washing solution from scattering to the substrate, which is dried by the dry air. |
