| 摘要 |
A booster pump for a semiconductor fabricating equipment is provided to prevent a process defective due to wearing of a sealing by replacing a piston type with a hydraulic type. First and second chambers(310,320) are filled with a liquid(400). A connection tube(330) connects lower portions of the first and second chambers to provide a flow path of the liquid. A first gas inflow line(341) and a first valve(351) supply a low-pressure gas into a liquid space of the first chamber. A first gas drain line(342) and a second valve(352) drain the low-pressure gas from the liquid space of the first chamber. A second gas inflow line(343) and a third valve(353) supply a low-pressure gas into a liquid space of the second chamber. A second gas drain line(344) and a fourth valve(354) drain the low-pressure gas from the liquid space of the second chamber.
|
