发明名称 SYSTEM FOR FEEDING PROCESS GAS
摘要 A system for supplying process gas is provided to enable inspection of real gas supplied to a process chamber by naked eyes by installing a flow meter capable of checking whether process gas is supplied to the process chamber. Various kinds of reaction gas are supplied through a plurality of individual supply lines. A plurality of valves, pressure adjusting units(112,122,132) and mass flow controllers(117,127,137) are installed in the individual supply lines. The various kinds of reaction gas supplied from the individual supply lines are unified to be a unified supply line so that process gas in which the various kinds of reaction gas supplied from the individual supply lines are mixed is generated, wherein the unified supply line supplies the process gas to a process chamber(160) through a delivery valve(150). A flow meter(140) is installed in a connection part of the individual supply lines and the unified supply line to monitor a supply state of the process gas. The flow meter includes a circular rotation plate which varies a rotation speed and a rotation direction according to the quantity and flow direction of the process gas.
申请公布号 KR20060134534(A) 申请公布日期 2006.12.28
申请号 KR20050054294 申请日期 2005.06.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, BONG JIN
分类号 H01L21/3065 主分类号 H01L21/3065
代理机构 代理人
主权项
地址