发明名称 OPTICAL SUBSTRATE, MANUFACTURING METHOD OF OPTICAL SUBSTRATE, PLANAR LIGHTING DEVICE, AND ELECTROOPTICAL APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an optical substrate capable of improving the evenness of luminance of light emitted from an emission surface and improving the productivity of an electrooptical apparatus, to provide a manufacturing method of the optical substrate, and to provide a planar lighting device and an electrooptical apparatus provided with the optical substrate. <P>SOLUTION: A liquid-repellent layer 22L which repels the droplets of a lens forming material is formed on an emission surface 22b of a light guide plate 22 which is arranged so that light made incident from an incident surface 22a is reflected on the reflection surface 22r side and the emission surface 22b side and is emitted from the emission surface 22b. Thereafter, the droplets are ejected to the emission surface 22b, and the droplets struck to the ejection surface 22b are irradiated with ultraviolet rays and are hardened. Thus, microlenses 25 which have a refractive index different from that of the light guide plate 22 and diffuse light made incident from the emission surface 22b are formed on the emission surface 22b of the light guide plate 22, wherein it is set that the direction of the maximum intensity of light diffused by the microlenses 25 comes to the optimum direction for a prism sheet 26. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006350179(A) 申请公布日期 2006.12.28
申请号 JP20050178972 申请日期 2005.06.20
申请人 SEIKO EPSON CORP 发明人 HASEI HIRONOBU
分类号 G02B5/02;F21V5/04;F21V8/00;F21Y101/02;G02F1/1335;G02F1/13357 主分类号 G02B5/02
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