| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment device of an exposure machine and an alignment method of exposure machine capable of accurately aligning a film to a substrate without influenced by loosening or warpage on a film side or a substrate side. <P>SOLUTION: An alignment operation of aligning a film F to a substrate K is carried out while pressurizing a space S. Thereby, the alignment operation can be performed with flatness of the film F and the substrate K improved, which means alignment in a similar state upon exposure and the film F and the substrate K are accurately aligned after tightly adhering the both. <P>COPYRIGHT: (C)2007,JPO&INPIT |
