METHOD FOR FABRICATING LIGHT EMITTING DEVICE WITH PHOTONIC CRYSTAL STUCTURE

摘要

A method for fabricating a light emitting device of a photonic crystal structure is provided to eliminate the necessity of an expensive photolithography process for forming a photonic crystal pattern by making a layer formed on a light emitting device structure have a photonic crystal pattern and by etching the light emitting device structure while using the photonic crystal pattern as a mask so that the light emitting device structure has a photonic crystal pattern. Mechanical pressure is applied to make a layer(310) formed on a light emitting device structure(300) have a shape of a photonic crystal pattern. The light emitting device structure is etched by using the photonic crystal pattern as a mask to form a light emitting device structure having a photonic crystal pattern. The layer on the light emitting device structure can be a polymer thin film.