| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ultra-low refractive index film with the refractive index close to the index value of air by reducing the refractive index lower than 1.2. <P>SOLUTION: A silicon substrate is spin coated with a porous silica material precursor solution, to which 50-65 mol% cetyl trimethyl ammonium chloride as a surfactant of a vacancy forming material had been added, at 500 rotations per second. After baking in a vacuum of 1 Pa at 400°C, the ultra-low refractive index film with 1.097-1.117 refractive index and vacancies with a nanometer size is obtained. <P>COPYRIGHT: (C)2007,JPO&INPIT |
