发明名称 DEPOSITION EQUIPMENT AND EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide deposition equipment, through which a flaw is less likely to be generated on a substrate rear surface and reaction products are less likely to come off, after a thinning process. SOLUTION: The deposition equipment has a stage surface 1a for holding an object substrate 2, such that it makes point contacts, the object substrate 2 composed of a material with glass or Vickers hardness of about 5,374 N/mm<SP>2</SP>. The stage surface 1a is formed of stainless steel, whose arithmetic average height Ra in roughness curve is equal to or greater than 0.1μm and smaller than 0.3μm, and whose maximum height Ra in roughness curve is equal to or greater than 0.5μm and smaller than 2.5μm. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006352033(A) 申请公布日期 2006.12.28
申请号 JP20050179611 申请日期 2005.06.20
申请人 SHARP CORP 发明人 OKAMURA TAKASHI;TANIDA TAKAHIRO;NAKAGAWA KOYO
分类号 H01L21/205;C23C16/458;H01L21/683 主分类号 H01L21/205
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