Apparatus for processing substrate using plasma,申请号KR20040026047-传众专利搜索

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发明名称	Apparatus for processing substrate using plasma
摘要
申请公布号	KR100661746(B1)	申请公布日期	2006.12.27
申请号	KR20040026047	申请日期	2004.04.16
申请人		发明人
分类号	H01L21/02	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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