发明名称 |
SURFACE TREATMENT METHOD, MANUFACTURING METHOD OF COLOR FILTER SUBSTRATE, AND MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE |
摘要 |
A surface processing method, a method for manufacturing a color filter substrate, and a method for manufacturing an electro-optical apparatus are provided to perform the plasma process of a substrate effectively and uniformly, by relatively reciprocating the substrate during the plasma process. A voltage is applied between a discharge generating unit including discharge generators(4a,4b) and a supporter(10), thereby obtaining plasma from gas supplied to a gap between the discharge generators and the substrate. One of the discharge generating unit and the substrate is relatively moved in a first direction while the substrate is exposed to the plasma. The moved one is relatively moved in a second direction contrary to the first direction while the substrate is exposed to the plasma.
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申请公布号 |
KR20060133476(A) |
申请公布日期 |
2006.12.26 |
申请号 |
KR20060054854 |
申请日期 |
2006.06.19 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRUMA KEI;TAKAHASHI KATSUHIRO |
分类号 |
G02F1/13;G02B5/20;G02F1/1335;H05H1/24;H05H1/46 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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