发明名称 SURFACE TREATMENT METHOD, MANUFACTURING METHOD OF COLOR FILTER SUBSTRATE, AND MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE
摘要 A surface processing method, a method for manufacturing a color filter substrate, and a method for manufacturing an electro-optical apparatus are provided to perform the plasma process of a substrate effectively and uniformly, by relatively reciprocating the substrate during the plasma process. A voltage is applied between a discharge generating unit including discharge generators(4a,4b) and a supporter(10), thereby obtaining plasma from gas supplied to a gap between the discharge generators and the substrate. One of the discharge generating unit and the substrate is relatively moved in a first direction while the substrate is exposed to the plasma. The moved one is relatively moved in a second direction contrary to the first direction while the substrate is exposed to the plasma.
申请公布号 KR20060133476(A) 申请公布日期 2006.12.26
申请号 KR20060054854 申请日期 2006.06.19
申请人 SEIKO EPSON CORPORATION 发明人 HIRUMA KEI;TAKAHASHI KATSUHIRO
分类号 G02F1/13;G02B5/20;G02F1/1335;H05H1/24;H05H1/46 主分类号 G02F1/13
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