| 摘要 |
<p>A method for manufacturing a pellicle frame is provided to prevent generation of particles on a surface of a photomask by cleaning a surface of the pellicle frame using deionized water and megasonic equipment. A frame is processed(S110). A surface of the frame is cleaned by using NaOH solution(S120). A whitening process is performed on the etched surface of the frame by dipping it into HNO3 solution(S130). An anodizing process is performed on the whitened frame by dipping it into H2SO4 solution(S140). The surface of the anodized frame is cleaned by using deionized water and megasonic equipment(S150). A plurality of holes formed on the surface of the anodized frame are partially filled with a fine dye powder(S160). Ni acetate is coated on the surface of the frame to prevent outflow of the dye powder from the holes(S170). The resultant frame is cleaned by using the deionized water and ultrasonic equipment.</p> |
