发明名称 |
Scanning exposure apparatus, manufacturing method thereof, and device manufacturing method |
摘要 |
A scanning exposure apparatus includes a master stage which holds a master and moves in a predetermined scanning direction, a projection optical system which projects a pattern of the master onto a substrate, and an optical element which is held by the master stage and moved together with the master. The optical element is so constituted as to optically correct a shift of the master held by the master stage from an ideal state.
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申请公布号 |
US7154581(B2) |
申请公布日期 |
2006.12.26 |
申请号 |
US20020327178 |
申请日期 |
2002.12.24 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SHIMA SHINICHI |
分类号 |
G03B27/42;G03B27/32;G03B27/52;G03B27/62;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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