Semiconductor device reducing plasma damage and method for fabricating the same,申请号KR20010014052-传众专利搜索

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发明名称	Semiconductor device reducing plasma damage and method for fabricating the same
摘要
申请公布号	KR100660832(B1)	申请公布日期	2006.12.26
申请号	KR20010014052	申请日期	2001.03.19
申请人		发明人
分类号	H01L27/092	主分类号	H01L27/092
代理机构		代理人
主权项
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