发明名称 INSPECTION METHOD AND INSPECTION ASSISTING DEVICE OF QUARTZ PRODUCT IN SEMICONDUCTOR PROCESSING SYSTEM
摘要 An inspection assisting device (3) being employed in an inspection for identifying metallic impurities contained in an inspection object part by touching the inspection object part of a quartz rod-like member (21) in a semiconductor processing system to a processing liquid composed of an etching liquid and then analyzing the processing liquid. The rod-like member (21) has a pair of recesses (22) located while holding the inspection object part between them. The inspection assisting device (3) comprises a pair of end plates (32) engaging with the pair of recesses, a frame (30) for connecting the pair of end plates, and a liquid receiving part (31) arranged between the pair of end plates. The liquid receiving part (31) has dimensions sufficient for storing the processing liquid and touching the inspection object part to the processing liquid.
申请公布号 KR20060133525(A) 申请公布日期 2006.12.26
申请号 KR20067004407 申请日期 2006.03.03
申请人 TOKYO ELECTRON LIMITED 发明人 OIKAWA MASAYUKI;ANBAI KATSUHIKO;TAKAHASHI NOBUHIRO;HAYASHI TERUYUKI
分类号 G01N1/28;G01N27/62;G01N1/32;H01L21/00;H01L21/673 主分类号 G01N1/28
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