Coating solution for forming silica film

摘要

To provide a silica film-forming material having a low dielectric constant and giving a film of less undergoing change in aging, a coating solution for forming a silica film includes a hydrolysis product of a mixture comprising: a tetraalkoxysilane; and at least one of a monoalkyltrialkoxysilane and a dialkyldialkoxysilane, and an ammonium salt represented by formula (I): wherein R¹ represents an alkyl group having from 6 to 30 carbon atoms, R² represents an alkyl group having from 1 to 5 carbon atoms, and X represents CH₃COO, SO₃H or OH.