| 摘要 |
A heater assembly of heat treatment equipment is provided to improve uniformity of temperature and thickness uniformity of a layer coated on a wafer by fixing stably a heating line and a temperature sensor. A heating resistor(110) is arranged spirally in an outer circumference of a process tube. An adiabatic member(120) is used for surrounding the heating resistor. A plurality of supporting members(130) are coupled with each other by using an inserting projection and groove structure to support the heating resistor. One or more supporting holders(140) are coupled with one end of the supporting members not to separate the supporting members from each other.
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