| 摘要 |
Described techniques extend (e.g., by a factor of 2) the dynamic range of voltage swing for amplifiers and other integrated circuits (e.g., buffers) that are fabricated using lower voltage rated semiconductor processes. Such processes include, for instance, thin gate oxide MOS, and other semiconductor processes that provide desirable features that are typically not associated with high voltage processes, such as increased radiation hardness, higher speed logic, and compactness. Thus, relatively large dynamic range is enabled for integrated circuits fabricated using feature-rich lower voltage rated semiconductor processes.
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